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UN NO 2193 Purity 99.9% FC1160 Electronic Gases For Semiconductor Manufacturing

Wuhan Newradar Special Gas Co.,Ltd

UN NO 2193 Purity 99.9% FC1160 Electronic Gases For Semiconductor Manufacturing

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Brand Name : Newradar Gas

Model Number : N/A

Certification : ISO/DOT/GB

Place of Origin : China

MOQ : 1000 kilogram

Price : negotiation

Payment Terms : L/C, , T/T, Western Union, MoneyGram

Supply Ability : 3,00 ton per month

Delivery Time : 15-25 working days after received your payment

Packaging Details : standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film

Thermodynamic data : Phase behaviour solid–liquid–gas

Spectral data : UV, IR, NMR, MS

Purity : 99.9%~99.999%

Other Names : Carbon hexafluoride, 1,1,1,2,2,2-Hexafluoroethane, Perfluoroethane, Ethforane, Halocarbon 116, PFC-116, CFC-116, R-116, Arcton 116, Halon 2600

Appearance : Colorless Liquefied Gas

UN NO. : 2193

Grade Standard : Electron Grade Industrial Grade

Synonyms : 1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116

Application : Electronics equipment,transformer,refrigerating fluid

MF : C2F6

MW : 138.01

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Purity 99.9% FC1160 Gases Used As A Versatile Etchant In Semiconductor Manufacturing

Hexafluoroethane​ Description:

1. Used as insulation gas, plasma etching agent, high dielectric strength Ling-agent
2. For the microelectronics industry for plasma etching gas and device surface cleaning, fiber production, low temperature refrigeration.
3. Harmful to the environment, the water and the atmosphere can cause pollution, the atmospheric ozone layer has a strong destructive force.

Specifications:

1. Physical properties

Commodity

Hexafluoroethane

Molecular Formula

R116

CAS No

76-16-4

UN No.

2193

Hazardous Class

2.2

MF:

C2F6

Cylinder Capacity

40L, 500L

Filling Weight

530kg/500L refillable cylinder

20kg/40L refillable cylinder

Storage and Transportation

Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories.

2. Typical technical data

Purity, % ≥99.8
Moisture, PPm ≤10
Acidity, PPm ≤1
Vapor Residue, PPm ≤100
Appearance Colorless, No turbid
Odor No Strange Stench

Molecular Weight 66.1
Boiling Point, °C -24.7
Critical Temperature, °C 113.5
Critical Pressure, Mpa 4.58
Specific Heat of Liquid, 30°C, [KJ/(kg°C)] 1.68
ODP 0
GWP 0.014

Applications:

Multi - Functional Etching Technology In The Production Of Semiconductor etching of metal
The Metal Substrate

It can be used in the selective etching of metal silicon metal and metal oxide.

Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket.


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