Brand Name : NEWRADAR
Model Number : NO
Certification : ISO9001
Place of Origin : WUHAN
MOQ : 30KGS
Price : negotiation
Supply Ability : 30TON
Delivery Time : 5-10 DAYS
Packaging Details : 30lb - 926L Cylinder package
CAS No. : 685-63-2
Other Names : 1,1,2,3,4,4-hexafluorbuta-1,3-dieen
Hazard Class : 2.3
Purity : 99.9%
Application : Semiconductor industry
Beschrijving : Toxisch, ontvlambaar gas
Purity 99.9% Hexafluoro-2-butyne, Use in semiconductor industry.
Description:
Hexafluoro1,3‐butadine is a toxic, colorless, odorless, flammable liquefied compressed gas.
C4F6 gas as an etchant gas for a high aspect ratio contact hole etching can be a good
alternative to PFC gases.
hexafluoro-1,3-butadiene (C4F6) dry etching gas it has developed in Russia. C4F6 enables dry etching at a line width of as narrow as 90 nm or less. It is therefore indispensable for processing system LSIs and high-speed, large-capacity memory devices that are increasingly used in digital electric appliances and liquid crystal displays.
Fluorocarbon gases are widely used for processing silicon oxide film. Compared with octafluorocyclobutane (C4F8) currently used for processing at the line width of 130 nm, C4F6 has the following advantages:
1.Very low environmental load as it is decomposed in less than two days in the atmosphere (compared with 3,200 years for C4F8)
2.Therefore, useful as an alternative to perfluorocarbons with high global warming potential.
3.High aspect ratio, resulting in narrow and deep grooves (suitable for processing at very narrow line width).
4.High selectivity (ensures etching of silicon oxide film only; does not affect photoresist, silicon substrate or nitride film)
Fysische eigenschappen
Aggregatietoestand | gasvormig |
Dichtheid | (bij 15°C) 1,427 g/cm³ |
Kookpunt | ca. -130 °C |
Smeltpunt | ca. -130 °C |
Dampdruk | ca. 6 °C |
Onoplosbaar in | (bij 20°C) 178.800 Pa |
Applications:
1. C4F6 can also be used as a kind of monomer.
2. It can use in the semiconductor processing materials operation
99.9% Purity Plus Specialty Gases Hexafluoro-2-Butyne For Semiconductor Industry Images |