Refrigerant R116 Electronic Gases Hexafluoroethane CAS 2551-62-4
Electronic Gases Hexafluoroethane is used as a versatile etchant in
semiconductor manufacturing. It can be used for selective etching
of metal silicides and oxides versus their metal substrates and
also for etching of silicon dioxide over silicon. The primary
aluminum and the semiconductor manufacturing industries are the
major emitters of hexafluoroethane.
Hexafluoroethane is relatively inert. The mixture is nonflammable
and nontoxic, though asphyxiation may occur because of displacement
of oxygen. Under prolonged exposure to fire or intense heat the
containers may rupture violently and rocket.
Hexafluoroethane is chemically inert in many situations, but can
react violently with strong reducing agents such as the very active
metals and the active metals. Can react with strong oxidizing
agents or weaker oxidizing agents under extremes of temperature.
Vapors may cause dizziness or asphyxiation without warning. Vapors
from liquefied gas are initially heavier than air and spread along
ground. Contact with gas or liquefied gas may cause burns, severe
injury and/or frostbite. Fire may produce irritating, corrosive
and/or toxic gases.
Some may burn but none ignite readily. Containers may explode when
heated. Ruptured cylinders may rocket.
1. Physical properties
530kg/500L refillable cylinder
20kg/40L refillable cylinder
Storage and Transportation
Use, store and transport below 45C. Store in cool and
well-ventilated areas. Keep away from fire, heat, sunlight and
flammable substances. Handle carefully when loading and unloading
to avoid damages to gas cylinders and accessories.
2. Typical technical data
|Vapor Residue, PPm||≤100|
|Appearance||Colorless, No turbid|
|Odor||No Strange Stench|
|Boiling Point, °C||-24.7|
|Critical Temperature, °C||113.5|
|Critical Pressure, Mpa||4.58|
|Specific Heat of Liquid, 30°C, [KJ/(kg°C)]||1.68|
|Multi - Functional Etching Technology||In The Production Of Semiconductor, and Refrigerant.|
|The Metal Substrate|
It can be used in the selective etching of metal silicon metal and
Under prolonged exposure to fire or intense heat the containers may
rupture violently and rocket.